Method of cleaning member in process container, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

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United States of America Patent

PATENT NO 12053805
APP PUB NO 20190255576A1
SERIAL NO

16280874

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Abstract

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There is provided a technique that cleans a member in a process container by performing a cycle a predetermined number of times, the cycle including: (a) separately supplying a cleaning gas and an additive gas that reacts with the cleaning gas, respectively, from any two supply parts among at least three supply parts into the process container after processing a substrate; and (b) separately supplying the cleaning gas and the additive gas, respectively, from any two supply parts among the at least three supply parts into the process container, wherein at least one selected from the group of the cleaning gas and the additive gas is supplied from different supply parts in (a) and (b).

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Patent Owner(s)

Patent OwnerAddress
KOKUSAI ELECTRIC CORPORATION3-4 KANDAKAJI-CHO CHIYODA-KU TOKYO 101-0045

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ebata, Shinya Toyama, JP 15 37
Hanashima, Takeo Toyama, JP 36 1697
Hiramatsu, Hiroaki Toyama, JP 25 101
Hisakado, Sadao Toyama, JP 8 51
Kamakura, Tsukasa Toyama, JP 47 1703
Kameda, Kenji Toyama, JP 46 769
Kuribayashi, Koei Toyama, JP 29 78
Saido, Shuhei Toyama, JP 62 1449
Sasaki, Takafumi Toyama, JP 96 1117
Yamagishi, Hiroto Toyama, JP 4 4
Yamaguchi, Takatomo Toyama, JP 45 1140

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