Chamber cleaning device and chamber cleaning method

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United States of America Patent

PATENT NO 12065734
APP PUB NO 20220356569A1
SERIAL NO

17870804

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Abstract

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The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.

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Patent Owner(s)

Patent OwnerAddress
JUSUNG ENGINEERING CO LTDGWANGJU-SI GYEONGGI-DO 12773

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Hyun Il Gwangju-Si, KR 13 41
Kim, Jae Ho Seoul, KR 207 1601
Lee, Dong Hwan Gwangju-Si, KR 182 965
Lee, Jae Wan Gwangju-Si, KR 10 7
Lim, Byung Gwan Gwangju-Si, KR 5 0
Yun, Ho Jin Gwangju-Si, KR 22 57

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