Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursor

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12076763
APP PUB NO 20180345330A1
SERIAL NO

16007876

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

In one implementation, a method for cleaning a processing chamber is provided. The method comprises introducing a reactive species into a processing chamber having a residual high-k dielectric material formed on one or more interior surfaces of the processing chamber. The reactive species is formed from a halogen-containing gas mixture and the one or more interior surfaces include at least one surface having a coating material formed thereon. The method further comprises reacting the residual high-k dielectric material with the reactive species to form a volatile product. The method further comprises removing the volatile product from the processing chamber. The removal rate of the residual high-k dielectric material is greater than a removal rate of the coating material. The high-k dielectric material is selected from zirconium dioxide (ZrO2) and hafnium dioxide (HfO2). The coating material includes a compound selected from alumina (Al2O3), yttrium-containing compounds, and combinations thereof.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Soo Young Fremont, US 263 13902
Rui, Xiangxin Campbell, US 61 303
Won, Tae Kyung San Jose, US 83 6743
Yim, Dong-Kil Pleasanton, US 38 1106
Zhai, Yujia Fremont, US 28 37
Zhao, Lai Campbell, US 41 66

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
3.5 Year Payment $1600.00 $800.00 $400.00 Mar 3, 2028
7.5 Year Payment $3600.00 $1800.00 $900.00 Mar 3, 2032
11.5 Year Payment $7400.00 $3700.00 $1850.00 Mar 3, 2036
Fee Large entity fee small entity fee micro entity fee
Surcharge - 3.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00