Coating composition for pattern inversion

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United States of America Patent

PATENT NO 12084592
APP PUB NO 20190292403A1
SERIAL NO

16339489

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Abstract

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A coating composition for pattern inversion that fills a gap in an organic underlayer film pattern formed on a substrate to be processed by transferring a resist pattern to an underlayer and forms a flat polysiloxane film, the coating composition including a polysiloxane obtained by a reaction of an alcohol with a silanol group in a hydrolysis-condensate of a hydrolysable silane having a hydrolysable silane containing in the molecule four hydrolysable groups, in a ratio of 50% by mole to 100% by mole relative to the total amount of silanes. The hydrolysable silane is represented by Formula (1):

description='In-line Formulae' end='lead'R1aSi(R2)4-a  Formula (1)description='In-line Formulae' end='tail'

and contains 50% by mole to 100% by mole of a hydrolysable silane in which a is 0 and 0% by mole to 50% by mole of a hydrolysable silane in which a is 1 or 2. The alcohol is propylene glycol monomethyl ether, propylene glycol monoethyl ether, or 3-methoxybutanol.

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Patent Owner(s)

Patent OwnerAddress
NISSAN CHEMICAL CORPORATION5-1 NIHONBASHI 2-CHOME CHUO-KU TOKYO 1036119 ?1036119

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Yuki Toyama, JP 107 757
Nakajima, Makoto Toyama, JP 146 704
Shibayama, Wataru Toyama, JP 61 227
Shigaki, Shuhei Toyama, JP 46 68
Yaguchi, Hiroaki Toyama, JP 13 53

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