Particle removing assembly and method of cleaning mask for lithography

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12085866
APP PUB NO 20230314963A1
SERIAL NO

18200951

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Abstract

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A photolithographic apparatus includes a particle removing cassette, a pump and a compressor. The particle removing cassette includes a first slit that includes an array of parallel wind blade nozzles arranged along a length of the first slit, protruding from the first slit, and configured to eject and direct pressurized cleaning material to a patterning surface of a mask to remove debris particles on the patterning surface. The pump and the compressor are controlled by a controller to adjust a flow rate and a pressure of the pressurized cleaning material based on an amount of debris particles on the patterning surface of the mask.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTDNO 8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chia-Jen Jhudong Township, TW 98 1413
Lee, Hsin-Chang Zhubei, TW 203 1090
Lin, Chen-Yang Zhudong Township, TW 17 187
Lin, Kuan-Wen Taichung, TW 23 45
Wang, Li-Hsin Taipei, TW 5 7
Yu, Da-Wei Hsinchu, TW 5 4

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