Preparation method, apparatus, and device for coplanar waveguide structure, and superconducting device

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United States of America Patent

PATENT NO 12095134
APP PUB NO 20220285819A1
SERIAL NO

17651334

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Abstract

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A method for preparing a coplanar waveguide structure includes acquiring a structure to be etched, the structure to be etched including an aluminum film provided on a substrate structure and a photoresist structure provided at an upper end of the aluminum film, wherein the photoresist structure is configured to cover partial areas of the aluminum film; performing a first etching operation on the aluminum film provided on the substrate structure by using an acidic solution to obtain a first etched structure; rinsing the first etched structure to obtain an intermediate structure; performing a second etching operation on the intermediate structure by using an alkaline solution to obtain a second etched structure; and rinsing the second etched structure to obtain a target structure for generating a coplanar waveguide structure, the target structure including the aluminum film and the photoresist structure, wherein the photoresist structure covers all areas of the aluminum film.

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Patent Owner(s)

Patent OwnerAddress
ALIBABA (CHINA) CO LTDRM 508 5TH FLOOR TOWER 4 699 WANG SHANG ROAD BINJIANG DISTRICT HANGZHOU 310052

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tang, Chengchun Hangzhou, CN 6 39

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