Substrate treatment device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12109597
APP PUB NO 20210323036A1
SERIAL NO

17230152

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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According to one embodiment, a substrate treatment device includes a placement stand configured to rotate the substrate, a cooling part configured to supply a cooling gas into a space between the placement stand and the substrate, a first liquid supplier configured to supply a first liquid on a surface of the substrate, a second liquid supplier configured to supply a second liquid on the surface, and a controller controlling rotation of the substrate, supply of the cooling gas, the first and second liquids. The controller performs a preliminary process of supplying the second liquid on the surface, and supplying the cooling gas into the space, a liquid film forming process by supplying the first liquid toward the surface after the preliminary process, a supercooling process of the liquid film on the surface, and a freezing process of at least a part of the liquid film on the surface.

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Patent Owner(s)

Patent OwnerAddress
SHIBAURA MECHATRONICS CORPORATION5-1 KASAMA 2-CHOME SAKAE-KU YOKOHAMA-SHI KANAGAWA 247-8610

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Demura, Kensuke Yokohama, JP 25 41
Kamiya, Masaya Yokohama, JP 11 18
Matsushima, Daisuke Yokohama, JP 18 52
Nakamura, Minami Yokohama, JP 5 1
Nakamura, Satoshi Yokohama, JP 476 4052

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