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Abstract

The invention is referred to chemical technology, namely to active high-purity magnesium oxide and its production method. Active high-purity magnesium oxide, including the surface treated one, has BET specific surface area from 70 to 200 m²/g, average particle size (d50) determined by laser diffraction method not more than 10 microns, iodine activity in the range from 70 to 200 mg J/g MgO, citric activity not more than 40 s, pore volume in the range from 3.2×10⁻² cm³/g to 10.2×10⁻² cm³/g, diameter of 10% of the particles not more than 2 microns, diameter of 90% of the particles not more than 30 microns, mass fraction of residue on the 150 micron sieve not more than 1%, mass fraction of residue on the 45 micron sieve not more than 2%, mass fraction of chlorides not more than 0.1%, mass fraction of calcium not more than 0.1%, mass fraction of substances insoluble in hydrochloric acid not more than 0.05%, mass fraction of iron not more than 0.005%, mass fraction of impurities of each of Ti, Co, Mo, V, Sb, Ba cations not more than 1 ppm, Pb, Cd, As, Hg not more than 0.1 ppm.

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