Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method

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United States of America Patent

PATENT NO 12111566
APP PUB NO 20240036457A1
SERIAL NO

18483453

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the following order on a substrate, a multilayer reflective film and a phase-shift film that shifts the phase of EUV light, said reflective mask blank characterized in that the phase-shift film has a thin film comprising a metal-containing material that contains: ruthenium (Ru); and at least one element from among chromium (Cr), nickel (Ni), (Co), aluminum (Al), silicon (Si), titanium (Ti), vanadium (V), germanium (Ge), niobium (Nb), molybdenum (Mo), tin (Sn), tellurium (Te), hafnium (Hf), tungsten (W), and rhenium (Re).

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Patent Owner(s)

Patent OwnerAddress
HOYA CORPORATIONTOKYO 160-8347

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ikebe, Yohei Tokyo, JP 39 215
Shoki, Tsutomu Tokyo, JP 81 679

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