Dual source injector with switchable analyzing magnet

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12112918
SERIAL NO

18481111

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Abstract

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An ion implantation system has a mass analyzing magnet having interior and exterior region and defining a first entrance, second entrance, and an exit. A first ion source defines a first ion beam directed toward the first entrance along a first beam path. A second ion source defines a second ion beam directed toward the second entrance along a second beam path. A magnet current source supplies a magnet current to the mass analyzing magnet. Magnet control circuitry controls a polarity of the magnet current based on a formation of the first or second ion beam. The mass analyzing magnet mass analyzes the respective first or second ion beam to define defining a mass analyzed ion beam along a mass analyzed beam path. At least one shield in the interior or exterior region prevents line-of-sight between the first and second ion sources. Beamline components modify the mass analyzed ion beam.

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Patent Owner(s)

Patent OwnerAddress
AXCELIS TECHNOLOGIES INC108 CHERRY HILL DRIVE BEVERLY MA 01915

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bassom, Neil Hamilton, US 20 38
Platow, Wilhelm Newburyport, US 12 27

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