EUV lithography apparatus

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United States of America Patent

PATENT NO 12119129
APP PUB NO 20230215594A1
SERIAL NO

18120905

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Abstract

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An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Li-Jui Hsinchu, TW 306 606
Chien, Shang-Chieh New Taipei, TW 193 696
Liu, Heng-Hsin New Taipei, TW 158 281
Tsai, Cheng Hung Hsinchu, TW 22 109
Yu, Sheng-Kang Hsinchu, TW 61 41

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