Ultrapure water supply apparatus, substrate processing system including the same, and substrate processing method using the same

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United States of America Patent

PATENT NO 12122702
APP PUB NO 20230302502A1
SERIAL NO

18094820

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Abstract

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Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI GYEONGGI-DO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Seyoon Hwaseong-si, KR 6 0
Lee, Jiyeon Hwaseong-si, KR 73 1035
Park, Juhui Hwaseong-si, KR 5 0
Shin, Cheolmin Hwaseong-si, KR 6 0
Yun, Jongha Suwon-si, KR 4 0

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