Back nozzle unit and apparatus for processing a substrate including back nozzle unit

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12128450
APP PUB NO 20220203408A1
SERIAL NO

17392389

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus for processing a substrate may include a processing module including at least one process chamber performing a desired process on a substrate and an index module transferring the substrate from an outside into the processing module. The at least one process chamber may include a supporting unit on which the substrate is placed and a back nozzle unit disposed under a bottom face of the substrate. The back nozzle unit may include a skirt, at least one back nozzle providing a cleaning solution onto the bottom face of the substrate and a gas nozzle providing a gas onto the bottom face of the substrate. The skirt may include a body and a plurality of first flow paths and a plurality of second flow paths which are formed in the body and provide a gas toward the bottom face of the substrate.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTD#278 MOSI-RI JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNGCHEONGNAM-DO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeon, Yunseok Cheonan-si, KR 1 1
Kang, Junkee Cheonan-si, KR 1 1
Lim, Junhyun Seoul, KR 1 1
Song, Gilhun Cheonan-si, KR 1 1

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