Substrate cleaning apparatus and substrate cleaning method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12131919
APP PUB NO 20220399210A1
SERIAL NO

17755446

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A particle removed from a substrate is suppressed from adhering to the substrate again. A substrate cleaning apparatus includes a substrate holder configured to hold the substrate; a gas nozzle configured to jet a cleaning gas to the substrate on the substrate holder; and a nozzle cover provided to surround the gas nozzle. The cleaning gas is jetted to a decompression chamber of the nozzle cover from the gas nozzle, and a gas cluster configured to remove the particle on the substrate in the decompression chamber is generated. A gas for a gas curtain is jetted from an end portion of the nozzle cover toward the substrate, and the gas curtain is formed between the substrate and the end portion of the nozzle cover.

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First Claim

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDAKASAKA BIZ TOWER 3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akimoto, Masami Koshi, JP 112 3903
Nakashima, Tsunenaga Koshi, JP 28 177

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