Vapor phase deposition of organic films

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United States of America

PATENT NO 12138654
APP PUB NO 20220323991A1
SERIAL NO

17808384

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Abstract

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Methods and apparatus for vapor deposition of an organic film are configured to vaporize an organic reactant at a first temperature, transport the vapor to a reaction chamber housing a substrate, and maintain the substrate at a lower temperature than the vaporization temperature. Alternating contact of the substrate with the organic reactant and a second reactant in a sequential deposition sequence can result in bottom-up filling of voids and trenches with organic film in a manner otherwise difficult to achieve. Deposition reactors conducive to depositing organic films are provided.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B V1322 AP ALMERE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huotari, Hannu Helsinki, FI 48 7437
Pore, Viljami J Helsinki, FI 66 9755
Tuominen, Marko Helsinki, FI 102 10592

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