Polishing composition

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12146077
APP PUB NO 20220089911A1
SERIAL NO

17541881

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Abstract

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Provided is a polishing composition that can effectively improve a polishing removal rate. According to the present invention, a polishing composition for polishing a polishing target material is provided. The polishing composition contains water, an oxidant, and a polishing removal accelerator, and does not contain abrasive. At least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt is contained as the polishing removal accelerator.

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Patent Owner(s)

Patent OwnerAddress
FUJIMI INCORPORATEDKIYOSU-SHI AICHI 452-8502

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Yasuaki Kiyosu, JP 24 119
Noguchi, Naoto Kiyosu, JP 22 132
Oda, Hiroyuki Kiyosu, JP 150 1968

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