Plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12148598
APP PUB NO 20220254611A1
SERIAL NO

17666871

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Abstract

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A plasma processing apparatus includes: a plasma processing chamber; a first conductive member disposed in the plasma processing chamber and having a first surface; a second conductive member having a second surface facing the first surface of the first conductive member; a third member disposed on at least one selected from the group of the first conductive member and the second conductive member and having a shape that varies according to a temperature change of the third member; and a control mechanism configured to change a temperature of the third member.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO JAPAN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kobune, Takaki Miyagi, JP 4 3
Li, Lifu Miyagi, JP 15 3

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