Substrate processing apparatus and cleaning method of mist guard

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12148632
APP PUB NO 20230001458A1
SERIAL NO

17810385

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Goto, Daisuke Koshi, JP 176 722
Hashimoto, Yusuke Koshi, JP 97 429
Higashijima, Jiro Koshi, JP 44 213
Mori, Kanta Koshi, JP 9 66
Ogata, Nobuhiro Koshi, JP 43 248

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