Ruthenium removal composition and method of producing magnetoresistive random access memory

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United States of America

PATENT NO 12150386
APP PUB NO 20220393104A1
SERIAL NO

17820056

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Abstract

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A treatment liquid contains orthoperiodic acid and water, and the pH is 11 or more. It is preferable that the content of orthoperiodic acid in the treatment liquid is 0.01% to 5% by mass with respect to the total mass of the treatment liquid.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM CORPORATIONTOKYO 106-8620

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mizutani, Atsushi Shizuoka, JP 129 834
Park, Keeyoung Shizuoka, JP 17 48

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