Ultraviolet and ozone clean system

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12159782
APP PUB NO 20240014028A1
SERIAL NO

18370481

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.

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Patent Owner(s)

Patent OwnerAddress
APPLIED MATERIALS INC3050 BOWERS AVENUE SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dagan, Eliyahu Shlomo Sunnyvale, US 12 1
Makhamreh, Khalid Los Gatos, US 28 194
Ogawa, Hiroki Yokohama, JP 19 199
Wu, Banqiu San Jose, US 64 1486

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