Electro-optical device fabricated on a substrate

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United States of America

PATENT NO 12164184
APP PUB NO 20220244583A1
SERIAL NO

17723295

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Abstract

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An electro-optical device is fabricated on a semiconductor-on-insulator (SOI) substrate. The electro-optical device comprises a silicon dioxide layer, and an active layer having ferroelectric properties on the silicon dioxide layer. The silicon dioxide layer includes a first silicon dioxide layer of the SOI substrate and a second silicon dioxide layer converted from a silicon layer of the SOI substrate. The active layer includes a buffer layer epitaxially grown on the silicon layer of the SOI substrate and a ferroelectric layer epitaxially grown on the buffer layer. The electro-optical device further comprises one or more additional layers over the active layer, and first and second contacts to the active layer through at least one of the one or more additional layers. Methods of fabricating the electro-optical device are also described herein.

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Patent Owner(s)

  • PSIQUANTUM CORP.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kumar, Nikhil Burlingame, US 54 285
Liang, Yong Niskayanna, US 114 447

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