Method and apparatuses for disposing of excess material of a photolithographic mask

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12164226
APP PUB NO 20220317564A1
SERIAL NO

17837411

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Abstract

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The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.

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Patent Owner(s)

  • CARL ZEISS SMT GMBH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baur, Christof Darmstadt, DE 44 310
Bret, Tristan Rixheim, FR 16 152
Budach, Michael Hanau, DE 38 159
Edinger, Klaus Lorsch, DE 35 425

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