Coating apparatus and coating method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12170189
APP PUB NO 20210193441A1
SERIAL NO

17125491

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Abstract

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A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source and a plasma generation source. The supporting rack has a supporting area for supporting the substrate. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber. The plasma generation source is arranged for exciting the coating forming material, wherein the supporting area of the supporting rack is located at a position between the monomer discharge source and the plasma generation source, so that the coating is evenly formed on the surface of the substrate, and the deposition velocity is increased.

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Patent Owner(s)

Patent OwnerAddress
JIANGSU FAVORED NANOTECHNOLOGY CO LTDDONGHUAN RD YUQI INDUSTRIAL PARK WUXI JIANGSU 214183

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Zong, Jian Wuxi, CN 49 30

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