Cyclic spin-on coating process for forming dielectric material

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United States of America

PATENT NO 12170199
APP PUB NO 20230411150A1
SERIAL NO

18362136

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Abstract

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The present disclosure is generally related to semiconductor devices, and more particularly to a dielectric material formed in semiconductor devices. The present disclosure provides methods for forming a dielectric material layer by a cyclic spin-on coating process. In an embodiment, a method of forming a dielectric material on a substrate includes spin-coating a first portion of a dielectric material on a substrate, curing the first portion of the dielectric material on the substrate, spin-coating a second portion of the dielectric material on the substrate, and thermal annealing the dielectric material to form an annealed dielectric material on the substrate.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTDHSIN-CHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bao, Tien-I Taoyuan, TW 278 5423
Huang, Yen-Chun New Taipei, TW 42 269
Kuo, Je-Ming Hsinchu, TW 6 4
Peng, Chih-Tang Zhubei, TW 74 691

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