Gas nozzle, manufacturing method of gas nozzle, and plasma treatment device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12183551
APP PUB NO 20220020563A1
SERIAL NO

17296052

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A gas nozzle according to the present disclosure includes a supply hole having a tubular shape and configured to guide a gas and an injection hole connecting to the supply hole. The gas nozzle configured to inject the gas from the injection hole is made from ceramics or single crystal including an oxide, a fluoride, or an oxyfluoride of a rare earth element or an yttrium aluminum composite oxide as a primary component. An arithmetic mean roughness Ra of an inner circumferential surface forming the supply hole is smaller on an outflow side than on an inflow side of the gas.

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Patent Owner(s)

Patent OwnerAddress
KYOCERA CORPORATIONKYOTO-SHI KYOTO 612-8501

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Noguchi, Yukio Koka, JP 58 414
Sahashi, Tomoya Omihachiman, JP 1 2

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