Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12186684
APP PUB NO 20240207760A1
SERIAL NO

18440767

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Abstract

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A method for cleaning substrates includes rotating a substrate; delivering deionized water on a surface of the substrate for pre wetting the surface of the substrate; delivering chemical solution with high temperature on the surface of the substrate for cleaning the surface of the substrate; changing the rotation speed of the substrate to a low rotation speed, and moving a ultra/mega sonic device. The method further includes turning on the ultra/mega sonic device and supplying a constant or pulse working power in a first cleaning cycle; turning off the ultra/mega sonic device, and delivering a high temperature chemical solution or deionized water. The method further includes turning on the ultra/mega sonic device and supplying a constant or pulse working power in a second cleaning cycle; turning off the ultra/mega sonic device, and delivering rinse chemical solution or deionized water on the surface of the substrate; and drying the substrate.

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Patent Owner(s)

Patent OwnerAddress
ACM RESEARCH (SHANGHAI) INCBUILDING 4 NO 1690 CAI LUN ROAD ZHANGJIANG HIGH-TECH PARK SHANGHAI 201203

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Fuping Shanghai, CN 45 43
Dai, Yingwei Shanghai, CN 4 1
Jia, Shena Shanghai, CN 19 20
Jiang, Chaowei Shanghai, CN 3 1
Wang, Danying Shanghai, CN 3 1
Wang, Hui Shanghai, CN 1115 8921
Wang, Jian Shanghai, CN 1906 17240
Wang, Xi Shanghai, CN 356 3114

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