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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
AGC INC	CHIYODA-KU TOKYO 1008405

International Classification(s)

• C08J:WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTE....
• C25B:ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE ....
• C08F:MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONL....
• H01M:PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT....
• C07C:ACYCLIC OR CARBOCYCLIC COMPOUNDS
• H01B:CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATER....
• B01J:CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS, CO....
• C08L:COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
• B01D:SEPARATION

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hirai, Takeshi	Tokyo, JP	32	48
Jomuta, Daisuke	Tokyo, JP	15	40
Tamitsuji, Chikaya	Tokyo, JP	21	124

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
3.5 Year Payment	$1600.00	$800.00	$400.00	Jul 7, 2028
7.5 Year Payment	$3600.00	$1800.00	$900.00	Jul 7, 2032
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Jul 7, 2036

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 3.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

Full Text

US Patent Application No: 12187821

Fluorosulfonyl group-containing compound, fluorosulfonyl group-containing monomer, and their production methods

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