Method of manufacturing gallium oxide substrate and polishing slurry for gallium oxide substrate

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United States of America

PATENT NO 12187918
APP PUB NO 20220002589A1
SERIAL NO

17481256

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Abstract

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A method of manufacturing a gallium oxide substrate includes polishing the gallium oxide substrate with a polishing slurry, wherein the polishing slurry contains manganese dioxide particles and water.

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Patent OwnerAddress
AGC INCCHIYODA-KU TOKYO 1008405

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirabayashi, Yusuke Tokyo, JP 20 242

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