EUV vessel perimeter flow auto adjustment

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12189298
APP PUB NO 20230359125A1
SERIAL NO

18223496

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Abstract

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In a method of generating extreme ultraviolet (EUV) radiation in a semiconductor manufacturing system one or more streams of a gas is directed, through one or more gas outlets mounted over a rim of a collector mirror of an EUV radiation source, to generate a flow of the gas over a surface of the collector mirror. The one or more flow rates of the one or more streams of the gas are adjusted to reduce an amount of metal debris deposited on the surface of the collector mirror.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Li-Jui Hsinchu, TW 306 606
Chien, Shang-Chieh New Taipei, TW 193 696
Hsu, Che-Chang Taichung, TW 25 22
Liu, Heng-Hsin New Taipei, TW 158 281
Yu, Sheng-Kang Hsinchu, TW 61 41

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