Phase shift mask blank, manufacturing method of phase shift mask, and phase shift mask

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12197121
APP PUB NO 20220137502A1
SERIAL NO

17502488

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Abstract

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A phase shift mask blank including a transparent substrate, an etching protection film formed on the transparent substrate, and a phase shift film formed in contact with the etching protection film, for exposure light being ArF excimer laser. The etching protection film is composed of a material containing hafnium and oxygen or hafnium, silicon and oxygen, and has a thickness of 1 to 30 nm, and a transmittance of not less than 85% with respect the exposure light, and the phase shift film is composed of a material containing silicon and being free of hafnium, and has a thickness of 50 to 90 nm.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kosaka, Takuro Joetsu, JP 52 118
Matsuhashi, Naoki Joetsu, JP 8 0
Mimura, Shohei Joetsu, JP 16 76

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