Substrate processing apparatus, process fluid treating apparatus, and ozone decomposition method
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United States of America
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Jan 14, 2025
Grant Date -
Apr 22, 2021
app pub date -
Dec 23, 2020
filing date -
Dec 23, 2020
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.
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