Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 12202019
APP PUB NO 20240017301A1
SERIAL NO

18360731

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A charged particle beam system is disclosed, comprising:

    a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, andat least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Koning, Johan Joost Delft, NL 17 98
Lattard, Ludovic Delft, NL 11 38
Lodewijk, Chris Franciscus Jessica Delft, NL 7 14
Mook, Hindrik Willem Delft, NL 8 23
Smits, Marc Delft, NL 15 26

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