Method for cleaning semiconductor process equipment and system thereof

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12214385
APP PUB NO 20230141790A1
SERIAL NO

17979795

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Abstract

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A method for cleaning semiconductor process equipment and a system thereof are provided. The method is adapted to apply to an object with at least one pollutant thereon and includes steps of providing multi-channel optical tweezers to irradiate the pollutant and locations where the pollutant is neighbor to, in order to let the optical tweezers generate a resultant force to the pollutant; and providing an airflow to the object. The resultant force is greater than a maximum static friction between the pollutant and the object so as to remove the pollutant.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chun-Hsiung New Taipei, TW 42 110
Chiu, Chun-Jung New Taipei, TW 10 7
Chuang, Wan-Chen New Taipei, TW 6 1

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