Systems and methods for pulse width modulated dose control

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12215421
APP PUB NO 20240093365A1
SERIAL NO

18526411

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Abstract

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A substrate processing system for treating a substrate includes N manifolds, Y groups of injector assemblies, and a dose controller, where Y and N are integers greater than one. Each of the Y groups of injector assemblies includes N injector assemblies located in a processing chamber. Each of the N injector assemblies in each group of injector assemblies is in fluid communication with one of the N manifolds, respectively, and includes a valve including an inlet and an outlet. The dose controller is configured to control pulse widths output to the Y groups of injector assemblies to provide temporal dosing of the substrate.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Gregor, Mariusch Gilroy, US 23 894

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