Chemical mechanical polishing pad and preparation thereof

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12220784
APP PUB NO 20230112228A1
SERIAL NO

17500630

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Abstract

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The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is a photopolymerizable composition containing a block copolymer, a UV curable acrylate, and a photoinitiator.

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Patent Owner(s)

  • ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Blomquist, Robert M River Edge, US 11 30
El-Sayed, Lyla M Boonton, US 19 179
Mills, Michael E Bear, US 41 469
Qian, Bainian Newark, US 54 363
Reddy, Kancharla-Arun Wilmington, US 2 1
Taylor, Bradley K West Chester, US 12 129
Xia, Shijing Hockessin, US 3 12

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