Systems and methods for producing ultrapure water for semiconductor fabrication processes

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United States of America

PATENT NO 12221371
APP PUB NO 20230295027A1
SERIAL NO

17699371

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Abstract

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Systems and methods for producing ultrapure water (UPW) for use in semiconductor fabrication include an ABA module that performs an advanced oxidation process (AOP) pre-treatment step, a bioremediation step, and an advanced oxidation process post-treatment step. Raw water flows through the ABA module, which is part of a water treatment system for producing ultrapure water. The ultrapure water is then used in a semiconductor fabrication process.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chiang, Shih-Hsiung Tainan, TW 2 0
Lin, En Tian Taoyuan, TW 12 1

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