Decomposing/cleaning composition, method for cleaning adhesive polymer, and method for producing device wafer

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United States of America

PATENT NO 12221595
APP PUB NO 20220119739A1
SERIAL NO

17420569

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Abstract

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Provided is a decomposing/cleaning composition for an adhesive polymer having a high etching rate and suppressed infiltration into a contact interface between a substrate such as a device wafer and an adhesive layer such as a fixing tape. The decomposing/cleaning composition of one embodiment is a decomposing/cleaning composition for an adhesive polymer containing a quaternary alkylammonium fluoride or a quaternary alkylammonium fluoride hydrate and an aprotic solvent, wherein the aprotic solvent contains (A) an N-substituted amide compound having no active hydrogens on the nitrogen atoms and (B) at least one organic sulfur oxide selected from the group consisting of sulfoxide compounds and sulfone compounds.

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Patent Owner(s)

  • RESONAC CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fukuyo, Tomoyuki Tokyo, JP 6 7
Miyahara, Kuniaki Tokyo, JP 5 12
Nakazaki, Susumu Tokyo, JP 5 29

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