Magnesium oxide sputtering target

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United States of America

PATENT NO 12224166
APP PUB NO 20210351023A1
SERIAL NO

17284003

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Abstract

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A sputtering target configured from a magnesium oxide sintered body, wherein a ratio of crystal grains of the magnesium oxide sintered body in which a number of pinholes in a single crystal grain is 20 or more is 50% or less. The present invention is a sputtering target configured from a magnesium oxide sintered body in which the generation of particles during sputtering is less.

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Patent Owner(s)

  • JX ADVANCED METALS CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kajita, Hiroki Ibaraki, JP 11 7
Narita, Satoyasu Ibaraki, JP 10 20
Shibuya, Yoshitaka Ibaraki, JP 33 139

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