Composition and method for silicon nitride CMP

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12227673
APP PUB NO 20200172761A1
SERIAL NO

16208779

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Abstract

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The invention provides a chemical-mechanical polishing composition for polishing a silicon nitride containing substrate. The composition includes an aqueous carrier; cationic silica particles dispersed in the aqueous carrier, the cationic silica abrasive particles having a zeta potential of at least 10 mV in the polishing composition; a polishing additive selected from the group consisting of a polyether amine, a polysilamine, a polyvinylimidazole, and a combination thereof, wherein the polyether amine and the polysilamine have corresponding weight average molecular weights of about 1,000 g/mol or less. The composition has a pH of greater than about 6. A method for polishing a silicon nitride containing substrate is also provided.

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Patent Owner(s)

  • CMC MATERIALS LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hung, Low Fernando Aurora, US 11 3
Ivanov, Roman A Aurora, US 9 2
Kraft, Steven Plainfield, US 30 110

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