Polishing composition comprising polishing particles having high water affinity

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12227674
APP PUB NO 20220356373A1
SERIAL NO

17869013

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Abstract

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A polishing composition having silica-based abrasive grains and a polishing method. A polishing composition having silica particles, wherein on the basis of a colloidal silica dispersion of the silica particles, the dispersion has an Rsp of 0.15 to 0.7 as measured using pulse NMR, and the colloidal silica particles have a shape coefficient SF1 of 1.20 to 1.80, wherein Rsp is calculated based on equation (1):

description='In-line Formulae' end='lead'Rsp=(Rav−Rb)/(Rb)  (1)description='In-line Formulae' end='tail'

    (wherein Rsp is an index that indicates water affinity; Rav is an inverse of a relaxation time of the colloidal silica dispersion; and Rb is an inverse of a relaxation time of a blank aqueous solution obtained by removing the silica particles from the colloidal silica dispersion), and the shape coefficient SF1 is calculated based on equation (2):SF1=(area of a circle whose diameter is a maximum diameter of the particle)/(projected area)  (2).

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Patent Owner(s)

  • NISSAN CHEMICAL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishimizu, Eiichiro Funabashi, JP 10 1
Mitsui, Shigeru Funabashi, JP 16 209
Nishimura, Tohru Funabashi, JP 21 234

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