Ultraviolet and ozone cleaning apparatus and method of using

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12233441
APP PUB NO 20240157411A1
SERIAL NO

17987591

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Abstract

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A cleaning apparatus for cleaning a substrate wherein the substrate is contacted with ozonated water and irradiating the substrate and the ozonated water with UV electromagnetic radiation from a UV lamp within a cleaning chamber; wherein greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm. Methods of cleaning a substrate are also presented.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dagan, Eliyahu Shlomo Sunnyvale, US 12 1
Makhamreh, Khalid Los Gatos, US 28 194
Wu, Banqiu San Jose, US 64 1486

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