CMP composition including anionic and cationic inhibitors

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12234382
APP PUB NO 20220033682A1
SERIAL NO

17384940

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Abstract

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A chemical mechanical polishing composition for polishing tungsten or molybdenum comprises, consists essentially of, or consists of a water based liquid carrier, abrasive particles dispersed in the liquid carrier, an amino acid selected from the group consisting of arginine, histidine, cysteine, lysine, and mixtures thereof, an anionic polymer or an anionic surfactant, and an optional amino acid surfactant. A method for chemical mechanical polishing a substrate including a tungsten layer or a molybdenum layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten layer or the molybdenum layer from the substrate and thereby polish the substrate.

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Patent Owner(s)

  • CMC MATERIALS LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jhang, Jin-Hao Taichung, TW 6 0
Ko, Cheng-Yuan Kaohsiung, TW 13 20
Wu, Hsin-Yen Kaohsiung, TW 7 5

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