EUV photomask and manufacturing method of the same

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12235573
APP PUB NO 20230384662A1
SERIAL NO

18361891

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Abstract

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A photomask and a method of manufacturing a photomask are provided. According to an embodiment, a method includes: providing a substrate; depositing a reflective layer including molybdenum layers and silicon layers over the substrate; depositing a capping layer over the reflective layer; depositing an absorption layer over the capping layer; and performing a treatment to form a border region including molybdenum silicide in the reflective layer.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Ching-Hsiang Hsinchu, TW 185 2817
Hsu, Feng Yuan Yilan County, TW 12 13
Shen, Tran-Hui Yunlin County, TW 19 116

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