Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group

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United States of America

PATENT NO 12242194
APP PUB NO 20180181001A1
SERIAL NO

15736262

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Abstract

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A resist underlayer film-forming composition in which a coating film having high flattening properties is formed on a substrate. A resist underlayer film-forming composition including an epoxy adduct (C) obtained by reacting an epoxy group-containing compound (A) with an epoxy adduct-forming compound (B), wherein one or both of the epoxy group-containing compound (A) and the epoxy adduct-forming compound (B) contain an optionally branched alkyl group having a carbon atom number of three or more. The epoxy adduct-forming compound (B) is at least one compound selected from the group consisting of carboxylic acid (B1), carboxylic anhydride (B2), a phenol compound (B3), a hydroxyl group-containing compound (B4), a thiol compound (B5), an amino compound (B6), and an imide compound (B7). The optionally branched alkyl group having a carbon atom number of three or more is contained in the epoxy adduct-forming compound (B). The optionally branched alkyl group has a C3-19 alkyl group.

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Patent Owner(s)

  • NISSAN CHEMICAL INDUSTRIES LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Takafumi Toyama, JP 85 967
Karasawa, Ryo Toyama, JP 36 358
Saito, Daigo Toyama, JP 32 278
Sakamoto, Rikimaru Toyama, JP 115 978

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