Deposition mask cleaning apparatus and deposition mask cleaning method

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12246362
APP PUB NO 20220219208A1
SERIAL NO

17477038

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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Provided are a deposition mask cleaning apparatus and a deposition mask cleaning method. The deposition mask cleaning apparatus includes a treated water bath containing treated water in which a deposition mask is immersed; a treated water generation part supplying the treated water to the treated water bath; a treated water supply pipe connecting the treated water bath and the treated water generation part; and a bubble generation part disposed in the treated water supply pipe and generating bubbles in the treated water. The treated water includes at least one of ozone water, hydrogen water, ammonia hydrogen water, and carbonated water. The bubbles include at least one of microbubbles having a bubble diameter of about 50 μm or less and nanobubbles having a bubble diameter of about 1 μm or less.

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Patent Owner(s)

  • SAMSUNG DISPLAY CO., LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
An, Chang Uk Cheonan-si, KR 2 0
Hong, Jae Min Seongnam-si, KR 14 71
Kang, Hyuk Cheonan-si, KR 106 2216
Kim, Jai Phoong Asan-si, KR 2 0

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