heterostructure film

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United States of America

PATENT NO 12247281
APP PUB NO 20240133017A1
SERIAL NO

17971683

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Abstract

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A method for coating a substrate with a Co-Pi modified BiVO4/WO3 heterostructure film includes direct current reactive sputtering tungsten (W) onto a substrate in a gaseous mixture containing oxygen to form a tungsten trioxide (WO3) film, direct current reactive sputtering bismuth (Bi) onto the tungsten trioxide (WO3) film in a gaseous mixture containing oxygen to form a dibismuth trioxide (Bi2O3) film, drop-casting a vanadyl acetylacetonate solution onto the Bi2O3 film and heating at a temperature of at least 450° C. in ambient air to convert the Bi2O3 film to a BiVO4 film, and photoelectrochemically coating the BiVO4 film with a cobalt-phosphate (Co-Pi) to form a modified film on the surface of the substrate. A photoanode containing the Co-Pi modified BiVO4/WO3 heterostructure film prepared by the method, and its application in water splitting.

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Patent Owner(s)

  • KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Drmosh, Qasem Ahmed Qasem Dhahran, SA 5 1
Kandiel, Tarek Dhahran, SA 2 0
Salih, Amar Kamal Mohmeadkhair Dhahran, SA 2 0
Yamani, Zain Hassan Dhahran, SA 30 24

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