Film-forming method and raw material solution

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United States of America

PATENT NO 12247285
APP PUB NO 20230313369A1
SERIAL NO

18020462

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Abstract

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A film-forming method in which film-formation is performed by heat-treating a mist of a raw material solution, the method including: dissolving metal gallium in an acidic solution containing at least one of hydrobromic acid and hydroiodic acid to prepare the raw material solution having a concentration of a metal impurity of less than 2%; and atomizing the raw material solution into a mist, and performing film-forming. This method can provide a film-forming method that can form a film having good crystallinity at a high film-forming rate.

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Patent Owner(s)

  • SHIN-ETSU CHEMICAL CO. LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sakatsume, Takahiro Takasaki, JP 11 0
Watabe, Takenori Annaka, JP 78 345

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