Cleaning method and substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12252786
APP PUB NO 20220364228A1
SERIAL NO

17753004

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Abstract

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A cleaning method according to an aspect of the present disclosure includes: supplying a halogen-containing gas that does not contain fluorine to an interior of a processing container that is capable of being exhausted via an exhaust pipe to perform a cleaning; and supplying a fluorine-containing gas to at least one of the interior of the processing container and an interior of the exhaust pipe to perform the cleaning after the supplying the halogen-containing gas to perform the cleaning.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Keisuke Nirasaki, JP 62 521
Fujita, Sena Nirasaki, JP 9 1
Hayashi, Hiroyuki Nirasaki, JP 237 2215
Miyahara, Tatsuya Nirasaki, JP 13 3
Oikawa, Masami Oshu, JP 23 49
Suzuki, Daisuke Nirasaki, JP 280 2087
Takezawa, Yoshihiro Nirasaki, JP 21 26

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