High refractive index nano-imprint lithography resin

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12253799
APP PUB NO 20230236499A1
SERIAL NO

18100695

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Abstract

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A photo nanoimprint lithography (P-NIL) resin is disclosed. The P-NIL resin comprises: a cross-linkable organic binder; solvent based inorganic nanoparticles dispersed in the P-NIL resin; and a solvent configured to be evaporated; the P-NIL resin having a viscosity in the range of 4,000 to 6,000 centipoise at 25° C. after the solvent is evaporated prior to curing the P-NIL resin; and the P-NIL resin having a refractive index of greater than 1.6 at 589 nm and glass transition temperature of greater than 50° C. after curing by a photo initiator.

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Patent Owner(s)

  • ADDISON CLEAR WAVE COATINGS INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ha, Chau Glen Ellyn, US 4 5
Newcomb, Martin Glen Ellyn, US 2 0

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