Substrate processing apparatus and substrate processing method

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United States of America

PATENT NO 12255081
APP PUB NO 20220319876A1
SERIAL NO

17657821

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Abstract

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A substrate processing apparatus includes multiple first substrate processing devices, one or more second substrate processing devices and a transfer unit. Each of the multiple first substrate processing devices is configured to process a substrate one by one. The one or more second substrate processing devices are configured to simultaneously process multiple substrates, which are processed in the multiple first substrate processing devices. The transfer unit is configured to simultaneously carry the multiple substrates, which are processed in the multiple first substrate processing devices, into a same second substrate processing device.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Enokida, Suguru Koshi, JP 42 387
Hayashi, Shinichi Koshi, JP 211 2964
Inadomi, Hiroaki Koshi, JP 25 73
Kimoto, Kouji Koshi, JP 5 4
Umezaki, Shota Koshi, JP 19 10

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